Elphal

用法例句

METHODS The paclitaxel(Ptx) poly(ethylene glyeol-lactic-co-glycolic acid)(mPEG-PLGA) nanoparticles were prepared by the interfacial deposition method.

方法采用界面沉积法制备紫杉醇mPEG-PLGA纳米粒(Ptx-Nps);应用透射电镜表征纳米粒的形态;粒径分析仪测其粒径及Zeta电位;研究mPEG在共聚物中的含量及紫杉醇投药量对纳米粒的影响;考察纳米粒对昆明小鼠肝癌H22的疗效和过敏实验。

5% Au/Fe2O3 was prepared by co-precipitation,deposition-precipitation and impregnation separately.

采用共沉淀法、沉积-沉淀法和浸渍法制备了1。

ZrO2 support and Au/ZrO2 catalyst were prepared by aqueous solution precipitation and deposition-precipitation method, respectively.

采用水溶液沉淀和沉积-沉淀法分别制备了ZrO2载体及相应的Au/ZrO2催化剂,通过CO氧化反应考察了载体的制备条件、催化剂的焙烧温度和预处理温度对催化剂活性的影响;通过X射线衍射、氢程序升温还原(H2-TPR)、X射线光电子能谱(XPS)表征,分析了影响催化剂活性的原因。

Some oxides(Al2O3,SiO2,TiO2,MgO)and H-ZSM-5 zeolite were used as supports to prepare Au catalysts by deposition-precipitation(DP)with urea as a precipitator.

选择不同氧化物(Al2O3,SiO2,TiO2,MgO)和H-ZSM-5分子筛作为载体,以尿素为沉淀剂,采用沉积-沉淀法制备了一系列负载型金催化剂。

Fabrication of hollow SiO_2 microsphere from SiOH-functionalized polymer latexes

表面化学沉积法制备SiO_2空心微球

Study of CVD Function coating on Molybdenum Substrate

钼表面化学气相沉积功能涂层的研究

Chemical Deposition of Hydroxyapatite on the Surface of Ti and NiTi;

Ti及NiTi合金表面羟基磷灰石的化学沉积

Electroless Plating Magnetic Metal Film on the Surface of NiTi Memory Alloy;

NiTi记忆合金表面化学沉积磁性金属薄膜

Progress in magnesium alloy surface coating technology

镁合金表面电化学沉积涂层技术新进展

Effects of Depositing Time on Electroless Ni-P Plating of Magnesium Alloy

沉积时间对镁合金表面化学镀镍磷合金的影响

HT-CVD(high temperature chemical vapour deposition)

高温化学蒸汽沉积法

Studies on the Synthesis and Characterization of One-Dimensional Carbon Nano Materials by Chemical Vapor Deposition Methods;

一维碳纳米材料的化学气相沉积法合成及表征

Preparation and Characterization of Aligned Carbon Nanotubes by Chemical Vapour Deposition;

化学气相沉积法制备碳纳米管阵列及其表征

The Fabrication and Characterization of Palladium Composite Membrane by Chemical Fluid Deposition;

化学流体沉积法钯复合膜的研制与表征

Mechanism and Influencing Factors on Surface Roughness of Ultra-smooth Polishing of Chemical Vapor Deposition Silicon Carbide

化学气相沉积碳化硅超光滑抛光机理与表面粗糙度影响因素

Study on Processing Parameters, Morphologies and Deposition Principle of Electroless Plating Nanocrystalline Copper;

化学镀纳米铜膜的工艺参数和表面形貌及沉积原理研究

Application of electro/electroless deposition techniques to the preparation and surface modification of magnesium-based hydrogen storage alloys

电沉积和化学镀技术在镁基储氢合金制备及表面改性中的应用

Effect of Plating Parameters on Plating Rate and Thickness as well as Surface Morphology of Electroless Tin Coating

化学镀锡工艺参数对沉积速率、镀层厚度及表面形貌的影响

Preparation and Characterization of Carbon Nanotubes by Plasma-enhanced Chemical Vapor Deposition;

等离子体增强化学气相沉积方法制备碳纳米管及其表征

a powdery deposit on a surface.

物体表面的粉状沉积物。

The dry plating method is a method for deposition of a metal on the surface of polymer material under vacuum and includes sputtering method, vapor deposition, vacuum deposition, etc.

干镀是一种在真空下在聚合物表面沉积金属的方法，包括溅射、气相沉积、真空沉积等。

Chemical reagents--Determination of specific surface area of solid supports used in chromatography

GB/T2922-1982化学试剂色谱载体比表面积的测定方法